Metalorganic Chemical Vapor Deposition (MOCVD) of GaAs Using Organometallic Arsenic Precursors
Author | : Thomas Robert Omstead |
Publisher | : |
Total Pages | : 358 |
Release | : 1989 |
ISBN-10 | : MINN:31951D00108532B |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Book Synopsis Metalorganic Chemical Vapor Deposition (MOCVD) of GaAs Using Organometallic Arsenic Precursors by : Thomas Robert Omstead
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