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Niobium Nitride Based Thin Films Deposited by DC Reactive Magnetron Sputtering
Language: en
Pages: 82

Niobium Nitride Based Thin Films Deposited by DC Reactive Magnetron Sputtering

Authors: Moushab Benkahoul
Categories:
Type: BOOK - Published: 2005 - Publisher:

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Reactive Direct Current Magnetron Sputtering of Ultrathin Superconducting Niobium Nitride Films
Language: en
Pages: 101

Reactive Direct Current Magnetron Sputtering of Ultrathin Superconducting Niobium Nitride Films

Authors: Andrew Edward Dane
Categories:
Type: BOOK - Published: 2015 - Publisher:

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DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples
The Ion-beam Reactive Sputtering Process for Deposition of Niobium Nitride Thin Films
Language: en
Pages: 658

The Ion-beam Reactive Sputtering Process for Deposition of Niobium Nitride Thin Films

Authors: Daniel Jenner Lichtenwalner
Categories:
Type: BOOK - Published: 1990 - Publisher:

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Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films
Language: en
Pages:

Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films

Authors:
Categories:
Type: BOOK - Published: 2003 - Publisher:

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Aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films
The Development and Characterisation of Advanced Ternary Nitride Thin Films Deposited by Reactive D.C Magnetron Co-sputtering Technology
Language: en
Pages: 644

The Development and Characterisation of Advanced Ternary Nitride Thin Films Deposited by Reactive D.C Magnetron Co-sputtering Technology

Authors: Richard Wuhrer
Categories: Magnetrons
Type: BOOK - Published: 2001 - Publisher:

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