Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source
| Author | : Giridhar Nallapati |
| Publisher | : |
| Total Pages | : 108 |
| Release | : 1999 |
| ISBN-10 | : OCLC:248523416 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source by : Giridhar Nallapati
Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source written by Giridhar Nallapati and published by . This book was released on 1999 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt:
