Thermal Plasma Chemical Vapor Deposition of Diamond and Silicon Nitride in a Triple Torch Reactor

Thermal Plasma Chemical Vapor Deposition of Diamond and Silicon Nitride in a Triple Torch Reactor
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Total Pages : 130
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ISBN-10 : OCLC:62693056
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Book Synopsis Thermal Plasma Chemical Vapor Deposition of Diamond and Silicon Nitride in a Triple Torch Reactor by : Nicole Jennifer Wagner

Download or read book Thermal Plasma Chemical Vapor Deposition of Diamond and Silicon Nitride in a Triple Torch Reactor written by Nicole Jennifer Wagner and published by . This book was released on 2003 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:


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