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Transient Modeling of Selective Chemical Vapor Deposition of Tungsten During a Via Filling Process
Language: en
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Type: BOOK - Published: 1992 - Publisher:

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Modeling of Chemical Vapor Deposition of Tungsten Films
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Type: BOOK - Published: 2013-11-11 - Publisher: Birkhäuser

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Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization o
Masters Theses in the Pure and Applied Sciences
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Authors: Wade H. Shafer
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Type: BOOK - Published: 2012-12-06 - Publisher: Springer Science & Business Media

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Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and S
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Language: en
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Masters Theses in the Pure and Applied Sciences
Language: en
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Authors: W. H. Shafer
Categories: Education
Type: BOOK - Published: 1994 - Publisher: Springer Science & Business Media

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Volume 37 (thesis year 1992) reports a total of 12,549 thesis titles from 25 Canadian and 153 US universities (theses submitted in previous years but only now r