Keywords: plasma diagnostics, thermal conductivity, AlN, pulsed DC sputtering.

Aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films

Magnetron sputtering is a popular vacuum plasma coating technique used for depositing metals, dielectrics, semiconductors, alloys, and compounds onto a wide ran

Diamond-based composites, with their advantages of hardness, high Young's modulus and the like, have demonstrated new and unusual features, such as stability to

"Aluminum nitride thin films ( -1000 A) have been deposited on silicon substrate by re active sputtering using Al target in 1 : 1 Ar:N2 environment. The atomic