A Detailed Investigation of Microwave Plasma-assisted Chemical Vapor Deposition Diamond Growth Parameters
Author | : Andrew Israel |
Publisher | : |
Total Pages | : 110 |
Release | : 1998 |
ISBN-10 | : OCLC:39698298 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Book Synopsis A Detailed Investigation of Microwave Plasma-assisted Chemical Vapor Deposition Diamond Growth Parameters by : Andrew Israel
Download or read book A Detailed Investigation of Microwave Plasma-assisted Chemical Vapor Deposition Diamond Growth Parameters written by Andrew Israel and published by . This book was released on 1998 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt: