A model for chemical vapor deposition of diamond in a radio-frequency induction thermal plasma
| Author | : Benjamin Weixing Yu |
| Publisher | : |
| Total Pages | : 286 |
| Release | : 1994 |
| ISBN-10 | : OCLC:31979834 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis A model for chemical vapor deposition of diamond in a radio-frequency induction thermal plasma by : Benjamin Weixing Yu
Download or read book A model for chemical vapor deposition of diamond in a radio-frequency induction thermal plasma written by Benjamin Weixing Yu and published by . This book was released on 1994 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
