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Advanced Short-time Thermal Processing for Si-based CMOS Devices
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Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2
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These proceedings describe processing, materials, and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topic
Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS
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Physics and Technology of High-k Gate Dielectrics II
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"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Man