Experimental Study of Chemical Vapor Deposition of Diamond Films in an Atmospheric-pressure Radio-frequency Plasma
| Author | : Chiahung Li |
| Publisher | : |
| Total Pages | : 134 |
| Release | : 1992 |
| ISBN-10 | : OCLC:38195360 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Experimental Study of Chemical Vapor Deposition of Diamond Films in an Atmospheric-pressure Radio-frequency Plasma by : Chiahung Li
Download or read book Experimental Study of Chemical Vapor Deposition of Diamond Films in an Atmospheric-pressure Radio-frequency Plasma written by Chiahung Li and published by . This book was released on 1992 with total page 134 pages. Available in PDF, EPUB and Kindle. Book excerpt:
