Liquid Phase Deposited Titanium Oxide as the Gate Insulator for AlGaN/GaN Heterostructure Field Effect Transistors
| Author | : 蔡明記 |
| Publisher | : |
| Total Pages | : 71 |
| Release | : 2008 |
| ISBN-10 | : OCLC:713163493 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Liquid Phase Deposited Titanium Oxide as the Gate Insulator for AlGaN/GaN Heterostructure Field Effect Transistors by : 蔡明記
Download or read book Liquid Phase Deposited Titanium Oxide as the Gate Insulator for AlGaN/GaN Heterostructure Field Effect Transistors written by 蔡明記 and published by . This book was released on 2008 with total page 71 pages. Available in PDF, EPUB and Kindle. Book excerpt:
