Metalorganic Chemical Vapor Deposition (MOCVD) of GaAs Using Organometallic Arsenic Precursors
| Author | : Thomas Robert Omstead |
| Publisher | : |
| Total Pages | : 358 |
| Release | : 1989 |
| ISBN-10 | : MINN:31951D00108532B |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Metalorganic Chemical Vapor Deposition (MOCVD) of GaAs Using Organometallic Arsenic Precursors by : Thomas Robert Omstead
Download or read book Metalorganic Chemical Vapor Deposition (MOCVD) of GaAs Using Organometallic Arsenic Precursors written by Thomas Robert Omstead and published by . This book was released on 1989 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt:
