Modeling of Plasma-enhanced Chemical Vapor Deposited Silicon Nitride Thin Films Into Confined Geometries
| Author | : Ronald James Spence |
| Publisher | : |
| Total Pages | : 460 |
| Release | : 1993 |
| ISBN-10 | : OCLC:31966663 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Modeling of Plasma-enhanced Chemical Vapor Deposited Silicon Nitride Thin Films Into Confined Geometries by : Ronald James Spence
Download or read book Modeling of Plasma-enhanced Chemical Vapor Deposited Silicon Nitride Thin Films Into Confined Geometries written by Ronald James Spence and published by . This book was released on 1993 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:
