Modelling and Experimental Study of Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films

Modelling and Experimental Study of Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films
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Total Pages : 210
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ISBN-10 : OCLC:19689124
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Book Synopsis Modelling and Experimental Study of Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films by : Chue-san Yoo

Download or read book Modelling and Experimental Study of Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films written by Chue-san Yoo and published by . This book was released on 1988 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt:


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Crystalline thin films of silicon nitride have been grown on a variety of substrates by microwave plasma-enhanced chemical vapor deposition using N2, O2, and CH