The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition

Download or read book The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition written by George Tecos and published by . This book was released on 2011 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: Various deposition parameters have been adopted to deposit carbon-based thin films on silicon subtrates via Plasma-Enhanced Chemical Vapor Detection (PECVD) with a Radio-Frequency Plasma. We seek a recipe and formulation for carbon film deposition by varying the ratios of input gases and subtrate temperature, with the goal of observing these effects on the deposited carbon film. Characterization of the samples was carried out through various procedures, including the Ion Beam Analysis (IBA) techniques: Rutherford/Non-Rutherford Backscattering Spectrometry (RBS/NRBS), Elastic Recoil Detection Analysis (ERDA), and Raman Spectroscopy. This data was analyzed to determine the purity, quality, elemental compensation, and interface integrity of each respective sample. We conclude that the films deposited on Si subtrates are polymer-like carbon films with 30-35 at% C and 65-70 at% H. The interface between the film and subtrate was found to be abrupt. The effect of subtrate temperature on the microstructure of the deposited films was found to be inconclusive. This study will lay the basis for future explorations into Western Michigan University produced CVD carbon-based films, and investigate the properties of these unique and profitable materials.